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Air Liquide Strengthens Domestic Supply of Diborane

기사입력2024.05.23 16:48


New Diborane Plant Completed in Sejong

Air Liquide Advanced Materials has completed construction of a new diborane plant, will begin supplying the domestic semiconductor industry in earnest, and strengthen its strategic partnership with domestic semiconductor manufacturers.

Air Liquide held a ceremony to mark the completion of its new Diborane plant at its Advanced Materials Center in Sejong City on the 22nd.

The new plant will provide customers with safe, high-quality diborane produced using cutting-edge manufacturing processes. Diborane is an essential material for manufacturing semiconductor chips.

The completion ceremony was attended by Armelle Levieux, Air Liquide Group's Executive Director in charge of Hydrogen Energy, Electronics and Innovation, Sejong City's Director of Economic and Industrial Affairs, Korea Gas Safety Corporation, and key customers.

With this facility, Air Liquide continues to strengthen the Korean semiconductor ecosystem and provides customers with a safe and reliable source of diborane to accelerate their continued innovation. The analytical and digital technologies installed at the plant enable it to meet the industry’s most stringent quality requirements.

The new plant represents Air Liquide’s leading strategy to localize the production of advanced materials in Korea.

It is part of Air Liquide's announcement that it will invest $200 million to build two large-scale advanced materials production bases in South Korea and Taiwan by July 2023. This project will further strengthen Air Liquide’s presence in Korea and its partnerships with strategic customers.

“Advanced semiconductor technology development is the cornerstone for the growth of transformative technologies such as artificial intelligence,” said Laurent Langellier, CEO of Air Liquide Advanced Materials. “As a global leader in the production of advanced materials for the semiconductor industry, we are determined to continue to develop and produce new and innovative materials to achieve the highest levels of performance for the next generation of advanced devices.”