Capable of screening the most complex masks in the IC industry
Teron Inspection System and Reticle Decision Center

KLA-Tencor Corporation announced three advanced reticle inspection systems applicable to mask technology below 10 nm: Teron™ 640, Teron™ SL655, and the Reticle Decision Center (RDC).

All three of these systems are key equipment that enables current and next-generation mask design, allowing for more effective identification of defects that cause significant and severe yield loss in mask operations and the photolithography process of IC manufacturing.

By utilizing innovative Dual Imaging technology, the Teron 640 inspection system provides the sensitivity required to precisely screen advanced optical masks in mask operations. The Teron SL655 inspection system has introduced the new STARlightGold™ to assist IC manufacturers in the preliminary inspection of incoming reticle quality, monitoring of reticle damage, and detection of reticle defects that have a serious impact on yield.

The comprehensive reticle quality measurements detected by the Teron inspector are supported by RDC, a data analysis and management system that provides a wide range of functions to derive automatic defective product disposal decisions, improve process cycles, and reduce reticle-related pattern errors affecting yield.

Dr. Yalin Xiong, Vice President and General Manager of KLA-Tencor’s Reticle Products Division (RAPID), explained, “Today’s complex patterning techniques, such as Spacer Assist Quadruple Patterning (SAQP), utilize highly complex masks, so the selection and maintenance of reticle conditions are critical to obtaining optimal wafer patterns. Our team has developed advanced reticle inspection and data analysis technologies applicable to both current and next-generation mask designs. By combining the rich datasets generated by the Teron 640 and Teron SL655 with the evaluation capabilities of the RDC, mask workshops and IC manufacturing rooms can more efficiently identify photolithographically critical reticle defects, thereby improving mask quality control and achieving better product patterns.”

Based on the industry-leading Teron reticle platform for mask workshops, the Teron 640 supports the inspection of advanced optical masks with a printability-based defective product disposal function through the use of 193nm exposure using dual imaging (high-resolution inspection and aerial imaging).

In addition, the Teron 640 includes advanced 'die-to-database' inspection algorithms that maximize defect sensitivity, as well as new, higher throughput options to reduce time to result. Numerous Teron 640 reticle inspection systems have been installed in foundries and logic manufacturers and are being used for high-performance reticle quality control.

STARlightGold, the core technology of the Teron SL655, generates valuable reference data from masks during input quality inspection and uses this data for mask re-screening inspection. This unique technology enables full-field reticle application and maximizes the detection of defects such as haze growth or contamination for a full range of mask types, including those utilizing highly complex optical proximity techniques.

The industry-leading production throughput of the Teron SL655 supports reduced cycle times required for sorting a larger number of reticles in conjunction with advanced multi-patterning techniques. Additionally, the Teron SL655 is capable of extreme ultraviolet (EUV) use, enabling collaboration with IC manufacturers requiring in-factory EUV reticle inspection. The Teron SL655 system is currently being evaluated in conjunction with IC manufacturers for in-factory reticle quality control and reticle re-sorting during chip production.

RDC is a comprehensive data analysis and storage platform that supports multiple KLA-Tencor mask operations and reticle inspection and metrology platforms for IC manufacturing. RDC provides multiple applications, including Automatic Defect Classification (ADC) which runs concurrently with inspection stations, and Lithography Plane Review (LPR), which analyzes the printability of defective items detected by reticle inspectors. These applications automate the decision to discard defective items, improving cycle times and reducing critical errors. Several smelters and memory manufacturers are adopting RDC for data management and analysis during mask sorting.

Teron 640, Teron SL655, and RDC combine the LMS IPRO6 reticle pattern position measurement system and the KT Analyzer® advanced data analysis system to provide a comprehensive reticle screening solution for advanced mask and IC manufacturers.

The Teron 640, Teron SL655, and RDC are also key components of KLA-Tencor's 5D Patterning Control Solution™, which helps IC manufacturers achieve better patterning performance through process monitoring and management in mask operations and manufacturing. To maintain the high performance and productivity required in leading-edge mask and IC manufacturing, KLA-Tencor's global comprehensive service network supports the Teron 640, Teron SL655, and RDC. For more detailed information, please refer to the 5D Patterning Control Solution webpage.