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Provides 6 times improved DC channel density compared to PXI SMU
National Instruments announced the PXIe-4163, a high-density source measurement unit (SMU).
This product provides a DC channel density six times higher than existing NI PXI SMUs for testing RF, MEMS, mixed-signal, and other analog semiconductor components.

"Due to groundbreaking technologies such as 5G, IoT, and autonomous vehicles, semiconductor manufacturers continue to face the pressure to develop and implement more efficient semiconductor testing methods from development to mass production," said Eric Starkloff, Vice President of Global Sales and Marketing at NI. "Semiconductor testing is a strategic focus for NI. We are expanding our software platforms and PXI capabilities to help semiconductor manufacturers address their key challenges, and this latest PXI SMU is a prime example of that."
Semiconductor manufacturers are rapidly adopting Semiconductor Test Systems (STS) for throughput and performance by leveraging the cost and space of mass production lines. The newly released PXIe-4163 SMU further complements these capabilities. It increases DC channel density to enhance parallel processing capabilities for multi-site applications and improves R&D-grade measurement quality in an immediately production-ready form factor. Engineers can utilize this combination to use the same device in the verification phase and mass production testing, which reduces data correlation issues and shortens time-to-market. Engineers can use the latest PXIe-4163 SMU in STS configurations or standalone PXI systems.
National Instruments announced the PXIe-4163, a high-density source measurement unit (SMU).
This product provides a DC channel density six times higher than existing NI PXI SMUs for testing RF, MEMS, mixed-signal, and other analog semiconductor components.
"Due to groundbreaking technologies such as 5G, IoT, and autonomous vehicles, semiconductor manufacturers continue to face the pressure to develop and implement more efficient semiconductor testing methods from development to mass production," said Eric Starkloff, Vice President of Global Sales and Marketing at NI. "Semiconductor testing is a strategic focus for NI. We are expanding our software platforms and PXI capabilities to help semiconductor manufacturers address their key challenges, and this latest PXI SMU is a prime example of that."
Semiconductor manufacturers are rapidly adopting Semiconductor Test Systems (STS) for throughput and performance by leveraging the cost and space of mass production lines. The newly released PXIe-4163 SMU further complements these capabilities. It increases DC channel density to enhance parallel processing capabilities for multi-site applications and improves R&D-grade measurement quality in an immediately production-ready form factor. Engineers can utilize this combination to use the same device in the verification phase and mass production testing, which reduces data correlation issues and shortens time-to-market. Engineers can use the latest PXIe-4163 SMU in STS configurations or standalone PXI systems.
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