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KLA Launches Two IC Micro-process Measurement Systems
Published2020.02.27 08:40SpectraShape Launches 11k Shape Measuring System
KLA announced on the 26th that it has launched the 'Archer™ 750 Overlay Metrology System' and the 'SpectraShape™ 11k Critical Dimension (CD) and Dimensional Shape Metrology System'.
The Archer 750 overlay metrology system measures overlay errors in situations where process variation exists. The SpectraShape 11k CD and dimensional shape metrology system measures wafer shape, structure, material, etc., and enables process monitoring during production operation.
Jon Madsen, Senior Vice President and General Manager of KLA’s Metrology Division, stated, “With the introduction of new structures and materials, IC manufacturers have come to use processes that require atomic-level measurements,” adding, “KLA’s Archer 750 and SpectraShape 11k provide the process control capabilities required by fab customers.”
The two systems are used in conjunction with KLA's '5D Analyzer® advanced data analysis system'.
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