Photonic structures using nano imprint can enhance light extraction and light trapping performance in the fields of light-emitting diodes (LEDs) and photovoltaic (PV) cells, and can also be applied to laser diode fields. These photonic structures can also enhance device performance.

The NIL Photonics Competence Center operates state-of-the-art clean rooms with dedicated process teams and support for initial mass production services not only at EVG headquarters in Austria but also at subsidiaries in North America and Japan.

Markus Wimplinger, Director of Technical Development and IP at EV Group, stated, "Nano imprint technology can significantly reduce existing lithography design and manufacturing time, and enables development of all products with photonic structures. Additionally, it can achieve production cost savings compared to conventional technologies such as e-beam devices for optical lithography and stepper systems."

For example, compared to conventional lithography technology, nano imprint technology enables the implementation of sub-micron structures with true three-dimensional nano-scale dimensions and patterns in the 20nm range across entire wafers, which expands the scope of new photonic applications.

Through the establishment of this NIL Photonics Competence Center, EVG can provide customers with the most advanced nano imprint systems while leveraging nano imprint technology to enhance customer advantages in resolution and operational costs. From the product development stage, EVG is working closely with customers to determine the best approaches to optimize their product designs and manufacturing processes.

The new NIL Photonics Competence Center was established based on EVG's over 15 years of experience in the nano imprint field and its technology of having installed the most nano imprint equipment worldwide.

EVG's nano imprint equipment portfolio includes the recently released EVG7200 UV-NIL system, which is a large-area soft nano imprint product applying EVG's next-generation SmartNIL™ technology suitable for mass production.

The EVG7200 and SmartNIL technology offer the advantage of significantly shorter process times and lower operational costs compared to existing competitors' nano imprint systems.