AMEC Begins Full-Scale 5nm Etching Equipment Production Line
Published2021.04.16 13:34AMEC's 5nm etching equipment has been fully deployed in the production lines of global semiconductor manufacturers.
AMEC Chairman Yin Zhiyao recently announced that AMEC's plasma etching equipment is being used in the production lines of leading global semiconductor manufacturers.
The equipment mentioned by Chairman Yin Zhao is a 5nm plasma etching device, and the global cutting-edge semiconductor manufacturing company mentioned by Chairman Yin Zhao is presumed to be TSMC.
TSMC introduced about 50 5nm plasma etching equipment from AMEC last year.
Accordingly, it is presumed that TSMC recently completed the introduction and equipment testing and has begun full-scale semiconductor production using this equipment.
Chairman Yin Zhao revealed that in addition to 5nm plasma etching equipment, advanced semiconductor companies are also using 65nm, 14nm, and 7nm equipment, and that MOCVD equipment is also being deployed for large-scale mass production.
AMEC's core product is dielectric etching equipment, and its current state-of-the-art technology is 5nm. It is also known to be developing 3nm technology.
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