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Power Density Exceeding 2A/mm² Achieved in 6×6×0.8mm³ Package, Supporting Both Horizontal and Vertical Power Delivery Configurations
Infineon Technologies has launched a dual-phase smart power stage product family targeting next-generation AI accelerators and vertical power delivery (VPD) modules. As hyperscalers and data center operators accelerate their AI infrastructure expansion, demand is growing for power solutions capable of reliably delivering high current from compact packages.
Infineon Technologies (Korean representative CEO Seungsu Lee) launched the TDA235E5 and TDA235E0 on the 15th.
The two products integrate OptiMOS™ 6 MOSFET and dual-phase driver IC into a 6×6×0.8mm³ package to achieve power density exceeding 2A/mm², the company stated.
Rakesh Renganathan, Vice President of Infineon's Power IC business division, said, "The TDA235E5 and TDA235E0 power stages provide high power density, excellent thermal performance, and design flexibility, enabling designers to develop products more quickly."
The two products support up to 300A peak current and 120A total design current (TDC).
The company explained they can be applied not only to next-generation AI xPU accelerators but also to data center server CPUs.
Supporting both lateral and vertical power delivery configurations, they secure the design flexibility required during the industry's transition to vertical power module architecture.
Junction-to-top thermal impedance characteristics are reported to be advantageous for integration with liquid cooling systems.
As processor socket power consumption increases and the limitations of air cooling become apparent, the company forecasts growing demand in this area.
Furthermore, when combined with Infineon's digital multiphase controllers, they support multi-rail architecture, thereby contributing to shortened development cycles for AI server platforms.
The TDA235E5 and TDA235E0 will be integrated throughout Infineon's AI server power delivery ecosystem, from grid interface to processor core power rails.
Infineon pursues a policy of providing scalable solutions to data center customers by combining the characteristics of silicon (Si), silicon carbide (SiC), and gallium nitride (GaN).
Engineering samples of both products are currently being provided for customer evaluation.
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