Supercritical Equipment Development: Semes, TEL, and DNS 3 Companies
Published2023.02.28 14:31With EUV technology being applied to advanced nodes, semiconductor scaling has reached the 3-nanometer generation. Capillary phenomena and particle issues arising from circuit miniaturization adversely affect yield, and competition in technology development for cleaning processes aimed at defect management has intensified. In light of this, we examined recent developments among major semiconductor equipment manufacturers regarding supercritical cleaning technology, which is called next-generation semiconductor cleaning technology, alongside the incident of supercritical cleaning technology leaking to China.
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