Etching gases used in semiconductor manufacturing often contain recalcitrant gases that contribute to global warming. Consequently, semiconductor materials companies are strengthening collaborations with manufacturing companies to develop alternative etching gases with lower global warming potentials.

Merck announced on the 3rd that it is partnering with Micron Technology to develop low global warming potential (GWP) gas solutions for semiconductor production.

Merck and Micron have been working together for a year to find alternatives to existing materials with high global warming potentials. Process performance verification testing is currently underway for an alternative etching gas with a lower global warming potential, developed by Merck's R&D team. The goal is to permanently introduce new, more sustainable gas solutions to future semiconductor production.

“Sustainability requires collaboration and cannot be achieved by thinking in silos or limiting ourselves to our own internal spheres,” said Kai Beckmann, member of the Merck Executive Board and chairman of the Merck Electronics Executive Board. “The entire value chain is being called upon to find new, common paths to achieve more together.”

He added, “Like Merck, Micron has set aggressive sustainability goals,” and “Merck is pleased to be able to contribute to Micron’s success.”

“Micron’s new goal is to reduce emissions from our global operations by 42% by 2030 compared to a 2020 baseline,” said John Whitman, Micron’s vice president of central team and procurement. “Micron is taking a multifaceted approach to meeting our net-zero commitment.” He explained, “This includes investing in advanced mitigation equipment, prioritizing the use of low-GWP gases, purchasing energy-efficient equipment, and purchasing renewable energy instead of fossil fuel-based energy.”

The business relationship between Merck and Micron has been long and deep, fostering deep trust. The companies stated that testing new gases with low global warming potentials is just the beginning of their collaboration in the area of sustainability. They also announced plans to research new materials to replace various high-global warming potential etching gases used in dry etching and chamber cleaning, contributing to achieving sustainability goals.