ASML, TSMC, and Samsung Play the '12-inch Photomask' Card…40-Year Semiconductor Standard Changes
Published2026.09.09 05:03ASML, TSMC, Samsung Electronics, and Intel have begun a joint industry standard transition in the era of High NA EUV, now pointing in the same direction. On the surface, this appears to be an announcement related to High NA EUV (extreme ultraviolet), the next-generation lithography equipment, but the essence of this move is not equipment adoption. It is an industry transformation project that changes the photomask specifications themselves, one of the core infrastructures of semiconductor production.
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