Successful Development of 5-Nano Process Using EUV Technology
| 25% area reduction and 20% power efficiency increase compared to 7nm
MPW Strengthens the Domestic Semiconductor Ecosystem Through SAFE

Samsung Electronics announced on the 16th that it has successfully developed a 5-nanometer process based on EUV (Extreme Ultra Violet) technology.

In addition, the company plans to ship 7nm products within this month and complete the design of 6nm products with the goal of mass production within this year.

Samsung Electronics' strategy is to strengthen its foundry technology leadership and the competitiveness of its system semiconductor business, which will lead the Fourth Industrial Revolution, by expanding its ultra-fine process portfolio.

Samsung Electronics' newly developed next-generation 5nm process reduces logic area by 25% compared to the existing 7nm process through cell design optimization, while also delivering 20% improved power efficiency and 10% improved performance. Furthermore, by leveraging design assets applied to the 7nm process, customers using the existing 7nm process can reduce design costs for the 5nm process.

Samsung Electronics is also fully ramping up mass production of its 7nm and 6nm foundry processes. Earlier this year, Samsung Electronics became the first in the industry to begin mass production of 7nm products using the EUV process, and plans to begin full-scale shipments this month. We are currently in production discussions with major customers for products based on the 6nm process, and the product design has been completed (tape-out) and mass production is scheduled for the second half of this year.

The EUV technology, which forms the basis of this ultra-fine process, utilizes an EUV light source with a shorter wavelength than conventional argon fluoride (ArF) light, enabling the creation of more detailed semiconductor circuits. This reduces the need for repeated multi-patterning processes, which involve engraving circuits, thereby improving performance and yield.

As Samsung Electronics secures core technology for advanced ultra-fine process foundry production, it is expected to strengthen the domestic system semiconductor ecosystem and enhance system semiconductor capabilities.

The foundry business has significant forward and backward linkages, as it requires the joint growth of various specialized companies in semiconductor equipment, materials, design, packaging, and testing.

Samsung Electronics plans to expand its 'MPW (Multi Project Wafer) Service', which produces multiple types of semiconductor products on a single wafer, to the latest 5nm process, allowing customers to more conveniently produce cutting-edge semiconductors.

In addition, through Samsung Electronics' foundry support program, 'SAFE (Samsung Advanced Foundry Ecosystem),' in addition to design assets, it provides design infrastructure to help design products based on the 5nm process, such as Process Design Kit (PDK), Design Methodologies (DM), and Electronic Design Automation (EDA). Fabless customers can use this to design products more easily and quickly, and bring new products to market sooner.

“Samsung Electronics’ EUV-based cutting-edge process has various strengths in performance and IP, and we expect high demand centered on new applications such as 5G, AI, and automotive,” said Bae Young-chang, Vice President of Strategic Marketing at Samsung Electronics’ Foundry Business Division. “We will continue to lead the future system semiconductor industry with our advanced process solutions.”

Samsung Electronics is producing cutting-edge EUV-based process products at its latest foundry production facility, the S3 line at its Hwaseong Campus, and plans to begin full-scale operation of the dedicated EUV line at its Hwaseong Campus, currently under construction, starting in 2020.